The Keck Center is located in the Harker Interdisciplinary Science and Engineering (ISE) Laboratory on the UD campus. It houses two 200 kV field emission transmission electron microscopes, Talos F200C and JEM-2010F, a LaB6 300kV TEM JEM-3010, an FEI 120kV Tecnai G2 12 Twin transmission electron microscope, two scanning electron microscopes (JSM-7400F and AURIGATM 60 CrossBeamTM with the AURIGATM 60 being a FIB-SEM dual beam instrument), and two scanning probe microscopes (Multimode NanoScope V and Dimension 3100 V).
The Talos F200C has the design with an ultra-precision stage and a constant power objective lens system. It provides better than 2.3 Å point-to-point resolution. The peripheral attachments include the scanning transmission electron microscopy (STEM) for bright field (STEM-BF) imaging, annular dark field (ADF), intermediate and high angle annular dark field (STEM-HAADF) imaging, electron energy loss spectroscopy (EELS), phase plate and tomography operations. In addition, there are two CMOS based cameras (Ceta and Falcon-II) for high resolution and low dose imaging.
The JEM-2010F FasTEM provides 1.9 Å point resolution and 1.0 Å lattice resolution with an information limit of 0.75 Å. A few peripheral attachments further enhance its analytical capabilities; these include the scanning transmission electron microscopy (STEM) for both bright field (STEM-BF) imaging and high angle annular dark field (STEM-HAADF) imaging, electron energy loss spectroscopy (EELS) and energy filtered imaging, and X-ray energy dispersive spectroscopy (XEDS).
The Tecnai G2 12 Twin TEM is facilitated with cryo-TEM and low dose imaging capabilities n addition to conventional imaging and diffraction.
The JSM-7400F field emission scanning electron microscope has a 1 nm resolution at 15 kV and a 1.5 nm resolution at 1 kV. It allows operation in a wide range of beam energies from 0.1 keV to 30 keV, and affords various operation modes, including secondary electron imaging, backscattered electron imaging, gentle beam mode, and imaging with energy filters. An ultrathin window energy-dispersive X-ray spectroscopy (XEDS) detector identifies elements of atomic number greater than four, and offers a 130 eV spectral resolution.
The AURIGATM 60 CrossbeamTM FIB-SEM provides high resolution solutions for nano-tomography, 3-D imaging and analysis, lamellar and thin foil preparation, and nano-patterning. In conjunction with an Axio Imager M2 light microscope, a “Shuttle & Find” correlative microscopy scheme allows the visible light contrasts and information about feature color, size, and morphology obtained by the light microscope to be combined with advanced analytical methods of the AURIGATM 60 electron and ion optics for the discovery of new structural and elemental information. Additionally, the view-and-slicing capability of the FIB-SEM extends the opportunities to correlative tomography. The high resolution FIB optics of AURIGATM 60, together with its high precision stage, also enables nano-scale patterning or fiducial mark preparation, which can further facilitate other correlative analyses, such as those offered by vibrational spectroscopy.
The Keck Center has over 14 different TEM sample holders, including routine single and double tilt holders, low-background analytical holders, liquid nitrogen cryo-holders and cryo-transfer holders, Protochips Aduro 300 heating & electric holder and Poseidon 500 electrochemical holder, and a Hysitron PI 95 Picoindenter. We have a variety of sample preparation equipment, including 3 ultra-microtomes with cryo-microtomy capabilities, 2 Vitrobot® stations for TEM sample vitrification and cryo-transfer, dimple devices, ion mills (including a PIPS), sputter coaters, carbon coaters, and a low speed diamond saw.
The Talos F200C, JEM-2010F, AURIGATM 60 CrossbeamTM, and JSM-7400F all allow remote access and control to facilitate classroom teaching or research collaboration.
The facility houses two scanning probe microscopes (SPM): a general purpose NanoScope V and a Dimension-3100 V. The Dimension-3100 V includes 1) NanoMan-VS Nanolithography Software and User Interface that enables manipulation and lithography at the nanometer and molecular scale, 2) TUNA module for electric measurement, and 3) Real-time HarmoniX that measures variations in material properties during Tapping-Mode Imaging to provide independent nanometer scale images of peak force, adhesion, stiffness, dissipation, and average force.
The laboratory staff and associated faculty members are very knowledgeable in SEM, TEM, and SPM and are experts in advanced microscopy of a wide range of materials. We work with users on campus and other organizations in many areas including research, research training, and consultation.